Optimisation of masked ion irradiation damage profiles in YBCO thin films by Monte Carlo simulation

نویسندگان

  • Nianhua Peng
  • Chris Jeynes
  • Roger Webb
  • Ivan Chakarov
  • Mark Blamire
چکیده

Systematic Monte Carlo simulation studies have been carried out to search for a possible optimal experimental condition on the irradiation damage profile production with a given mask structure. The results suggest that minimum ion scattering broadening tails could be achieved with projectile ranges in Nb mask about half of the mask thickness. Provided the projectile range to mask thickness is maintained, similar irradiation damage profiles could be created by different ions, including ions as heavy as Cuþ. 2002 Elsevier Science B.V. All rights reserved.

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تاریخ انتشار 2002